A Newly Developed Surface Wave Microwave Plasma Chemical Vapor Deposition (SWMP-CVD) for Preparation of Nitrogen Doped Amorphous Carbon Thin Films

MAHMOOD, MOHAMAD RUSOP BIN (2005) A Newly Developed Surface Wave Microwave Plasma Chemical Vapor Deposition (SWMP-CVD) for Preparation of Nitrogen Doped Amorphous Carbon Thin Films. In: UNSPECIFIED.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
PRISMA ID:	29951
URI:	http://oarr.uitm.edu.my/id/eprint/27603

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