Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system

This research compared the effect ofPDC and DC substrate biases applications at -500V and study the effect of PDC voltage variations (OV, -200V, -500V, -800V) during substrate cleaning on coating adhesion. The substrate and coating materials used were tungsten carbide(WC) and titanium nitride (TiN),...

書誌詳細
第一著者:	Hanizam , Hashim
フォーマット:	学位論文
言語:	英語
出版事項:	2013
主題:	TJ Mechanical engineering and machinery
オンライン･アクセス:	http://eprints.utem.edu.my/id/eprint/15744/1/Effect%20of%20in%20SITU%20DC%20and%20PDC%20substrate%20bias%20cleaning%20process%20on%20TiN%20coating%20adhesion%20in%20PVD%20system006%2824%29.pdf

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