Lei , Z. C. (2019). Formation of ZrO2 gate dielectric on Ge substrate by thermal oxidation and post annealing for metal-oxide-semiconductor devices / Lei Zhen Ce.
शिकागो शैली (17वां संस्करण) प्रशस्ति पत्रLei , Zhen Ce. Formation of ZrO2 Gate Dielectric on Ge Substrate by Thermal Oxidation and Post Annealing for Metal-oxide-semiconductor Devices / Lei Zhen Ce. 2019.
एमएलए (9वां संस्करण) प्रशस्ति पत्रLei , Zhen Ce. Formation of ZrO2 Gate Dielectric on Ge Substrate by Thermal Oxidation and Post Annealing for Metal-oxide-semiconductor Devices / Lei Zhen Ce. 2019.
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