Lei , Z. C. (2019). Formation of ZrO2 gate dielectric on Ge substrate by thermal oxidation and post annealing for metal-oxide-semiconductor devices / Lei Zhen Ce.
Chicago Style (17th ed.) CitationLei , Zhen Ce. Formation of ZrO2 Gate Dielectric on Ge Substrate by Thermal Oxidation and Post Annealing for Metal-oxide-semiconductor Devices / Lei Zhen Ce. 2019.
MLA引文Lei , Zhen Ce. Formation of ZrO2 Gate Dielectric on Ge Substrate by Thermal Oxidation and Post Annealing for Metal-oxide-semiconductor Devices / Lei Zhen Ce. 2019.
警告：這些引文格式不一定是100％准確.