Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures / Maisara binti Othman

The fabrication and characterization of amorphous carbon nitride a-CNx thin films are intensively studied in this work. These films were obtained using radio frequency (rf) plasma enhanced chemical vapour deposition. In the first part of this work, a-CNx films were deposited either from methane and...

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Détails bibliographiques
Auteur principal:	Othman, Maisara
Format:	Thèse
Publié:	2012
Sujets:	Q Science (General) QC Physics

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