Hybrid plasma enhanced chemical vapour deposition/sputtering system for preparation of luminescent silicon carbon films / Nur Maisarah binti Abdul Rashid
Radio frequency plasma enhanced chemical vapour deposition (r.f PECVD) process is a well-established technique for depositing amorphous silicon carbon (a-SiC) films. However, an environmental friendly deposition technique which does not involve the use of toxic gas, silane (SiH4) is a much preferred...
| 主要作者: | |
|---|---|
| 格式: | Thesis |
| 出版: |
2013
|
| 主题: |