Structure, morphology, optical and electrochemical properties of indium- and aluminum-based nitride thin films deposited by plasma-assisted reactive evaporation / Mahdi Alizadeh Kouzeh Rash
A plasma-assisted reactive evaporation system was developed for the growth of indium- and aluminum-based nitride thin films. The effects of the most influential growth parameters were investigated with respect to the structure, elemental composition, morphology and optical properties of these films....
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| स्वरूप: | थीसिस |
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2016
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