Deposition and characterization of germanium nitride film using different thermal nitridation temperature / Low Yan Jie
This study is aimed at investigating the effect of thermal nitridation temperature on the growth of germanium nitride (?-Ge3N4) thin film and its effectiveness as a buffer layer to suppress the growth of unwanted germanium oxide (GeO2) interfacial layer. The ?-Ge3N4 films were grown on germanium sub...
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| स्वरूप: | थीसिस |
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2018
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