Silicon n-Channel Metal Oxide Semiconductor Field Effect Transistor Fabrication And Its Effect On Output Characteristics

n-channel metal oxide semiconductor field effect transistor (n-MOSFET) fabrication requires specialized and expensive technologies such as ion implantation, chemical vapor deposition (CVD) and hazardous gases such as silane (SiH4), HCl and hydrogen. Low cost emulsion photomask with 35 μm channel...

書目詳細資料
主要作者:	Mohd Rashid, Mohd Marzaini
格式:	Thesis
語言:	英语
出版:	2012
主題:	QC1 Physics (General)
在線閱讀:	http://eprints.usm.my/29062/

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