The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology
Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of...
| मुख्य लेखक: | |
|---|---|
| स्वरूप: | थीसिस |
| भाषा: | अंग्रेज़ी |
| प्रकाशित: |
2006
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| विषय: | |
| ऑनलाइन पहुंच: | http://eprints.usm.my/29274/ |
| Abstract | Abstract here |
| _version_ | 1855631508692271104 |
|---|---|
| author | Lee, Kang Hai |
| author_facet | Lee, Kang Hai |
| author_sort | Lee, Kang Hai |
| description | Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan
untuk technologi yang lebih rendah (0.13μm dan 0.22μm).
As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm. |
| first_indexed | 2025-10-17T08:02:18Z |
| format | Thesis |
| id | usm-29274 |
| institution | Universiti Sains Malaysia |
| language | English |
| last_indexed | 2025-10-17T08:02:18Z |
| publishDate | 2006 |
| record_format | EPrints |
| record_pdf | Restricted |
| spelling | usm-292742017-05-15T04:43:34Z http://eprints.usm.my/29274/ The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology Lee, Kang Hai R5-920 Medicine (General) Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm. 2006-07 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/29274/1/The_effect_of_implant_angle.pdf Lee, Kang Hai (2006) The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology. Masters thesis, USM. |
| spellingShingle | R5-920 Medicine (General) Lee, Kang Hai The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology |
| thesis_level | Master |
| title | The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology |
| title_full | The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology |
| title_fullStr | The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology |
| title_full_unstemmed | The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology |
| title_short | The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology |
| title_sort | effect of implant angle and resist shadowing in submicron implant technology |
| topic | R5-920 Medicine (General) |
| url | http://eprints.usm.my/29274/ |
| work_keys_str_mv | AT leekanghai theeffectofimplantangleandresistshadowinginsubmicronimplanttechnology AT leekanghai effectofimplantangleandresistshadowinginsubmicronimplanttechnology |