Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.

Pembentukan silikon berstruktur nano melalui teknik pengewapan terma telah dikaji dengan fungsi suhu penyepuhlindap dan pemangkin yang memainkan peranan penting dalam proses ini. Serbuk silikon sebagai bahan mentah telah digunakan bagi membolehkan pengewapan berlaku pada suhu yang tinggi (900-1100oC...

詳細記述

書誌詳細
第一著者: Adnan, Mohd Azam Mohd
フォーマット: 学位論文
言語:英語
出版事項: 2011
主題:
オンライン・アクセス:http://eprints.usm.my/43106/
Abstract Abstract here
_version_ 1855632184366333952
author Adnan, Mohd Azam Mohd
author_facet Adnan, Mohd Azam Mohd
author_sort Adnan, Mohd Azam Mohd
description Pembentukan silikon berstruktur nano melalui teknik pengewapan terma telah dikaji dengan fungsi suhu penyepuhlindap dan pemangkin yang memainkan peranan penting dalam proses ini. Serbuk silikon sebagai bahan mentah telah digunakan bagi membolehkan pengewapan berlaku pada suhu yang tinggi (900-1100oC) dalam aliran gas argon (Ar). The formation of silicon nanostructures, via thermal evaporation techniques, was studied as a function of annealing temperature and catalyst (Au and AuPd).The silicon powder, serving as the starting source material, was evaporated at a high temperature (900-1100°C) in the flow of argon gas.
first_indexed 2025-10-17T08:21:00Z
format Thesis
id usm-43106
institution Universiti Sains Malaysia
language English
last_indexed 2025-10-17T08:21:00Z
publishDate 2011
record_format EPrints
record_pdf Restricted
spelling usm-431062018-12-05T03:04:53Z http://eprints.usm.my/43106/ Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique. Adnan, Mohd Azam Mohd TN1-997 Mining engineering. Metallurgy Pembentukan silikon berstruktur nano melalui teknik pengewapan terma telah dikaji dengan fungsi suhu penyepuhlindap dan pemangkin yang memainkan peranan penting dalam proses ini. Serbuk silikon sebagai bahan mentah telah digunakan bagi membolehkan pengewapan berlaku pada suhu yang tinggi (900-1100oC) dalam aliran gas argon (Ar). The formation of silicon nanostructures, via thermal evaporation techniques, was studied as a function of annealing temperature and catalyst (Au and AuPd).The silicon powder, serving as the starting source material, was evaporated at a high temperature (900-1100°C) in the flow of argon gas. 2011-03 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/43106/1/Pages_from_EFFECT_OF_GROWTH_TEMPERATURE_AND_CATALYST_ON.pdf Adnan, Mohd Azam Mohd (2011) Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique. Masters thesis, Universiti Sains Malaysia.
spellingShingle TN1-997 Mining engineering. Metallurgy
Adnan, Mohd Azam Mohd
Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
thesis_level Master
title Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
title_full Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
title_fullStr Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
title_full_unstemmed Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
title_short Effect of growth temperature and catalyst on the formation of one-dimensional silicon nanostructures via thermal evaporation technique.
title_sort effect of growth temperature and catalyst on the formation of one dimensional silicon nanostructures via thermal evaporation technique
topic TN1-997 Mining engineering. Metallurgy
url http://eprints.usm.my/43106/
work_keys_str_mv AT adnanmohdazammohd effectofgrowthtemperatureandcatalystontheformationofonedimensionalsiliconnanostructuresviathermalevaporationtechnique