Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates

Cerium Oxide (CeO2) thin film has been deposited on silicon (Si) and silicon carbide (SiC) substrates using a radio frequency magnetron sputtering technique. The effect of post deposition annealing at different temperatures (400, 600, 800 and 1000oC) in argon (Ar) ambient for 30 minutes has been inv...

書目詳細資料
主要作者:	Chuah, Soo Kiet
格式:	Thesis
語言:	英语
出版:	2011
主題:	TN1-997 Mining engineering. Metallurgy
在線閱讀:	http://eprints.usm.my/43243/

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