Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment

Thin film Zr on Si and SiC were formed by sputtering. The films then underwent simultaneous oxidation and nitridation in N2O. The effects of oxidation/nitridation durations (5 20 min) and temperatures (500 1100oC) on the sputtered Zr/Si system and the effects of oxidation/nitridation temperatures (...

書誌詳細
第一著者:	Wong, Yew Hoong
フォーマット:	学位論文
言語:	英語
出版事項:	2012
主題:	TN1-997 Mining engineering. Metallurgy
オンライン･アクセス:	http://eprints.usm.my/44927/

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