The Development Of 8-Inch Roll-To-Plate Nanoimprint Lithography(8-R2p-Nil) System With Uv-Led Exposure

Lithography, a significant tool in microchip manufacturing experiences major changes in lens material and design due to reduction of radiation wavelength used in conventional lithography tool. This is caused by shrinkage of microchip size in accordance to Moore's law over the years. This paves...

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Bibliographic Details
Main Author:	Lee, Lai Seng
Format:	Thesis
Language:	English
Published:	2019
Subjects:	T Technology TJ Mechanical engineering and machinery
Online Access:	http://eprints.usm.my/51482/
Abstract	Abstract here

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