Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolith...

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Bibliographic Details
Main Author: Siow, Yuen Tien
Format: Thesis
Language:English
Published: 2008
Subjects:
Online Access:http://eprints.usm.my/9613/
Abstract Abstract here
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author Siow, Yuen Tien
author_facet Siow, Yuen Tien
author_sort Siow, Yuen Tien
description Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography
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institution Universiti Sains Malaysia
language English
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spelling usm-96132017-04-17T09:26:35Z http://eprints.usm.my/9613/ Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Siow, Yuen Tien TR925-1050 Photomechanical processes Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography 2008-11 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf Siow, Yuen Tien (2008) Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Masters thesis, Universiti Sains Malaysia.
spellingShingle TR925-1050 Photomechanical processes
Siow, Yuen Tien
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
thesis_level Master
title Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_fullStr Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full_unstemmed Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_short Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_sort cycle time analysis for photolithography tools in semiconductor manufacturing industry with simulation model a case study tr940 s618 2008 f rb
topic TR925-1050 Photomechanical processes
url http://eprints.usm.my/9613/
work_keys_str_mv AT siowyuentien cycletimeanalysisforphotolithographytoolsinsemiconductormanufacturingindustrywithsimulationmodelacasestudytr940s6182008frb