The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].
Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of...
| المؤلف الرئيسي: | |
|---|---|
| التنسيق: | أطروحة |
| اللغة: | الإنجليزية |
| منشور في: |
2006
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://eprints.usm.my/9830/ |
| Abstract | Abstract here |
| _version_ | 1855631284503576576 |
|---|---|
| author | Lee,, Kang Hai |
| author_facet | Lee,, Kang Hai |
| author_sort | Lee,, Kang Hai |
| description | Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm).
As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.
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| first_indexed | 2025-10-17T07:56:50Z |
| format | Thesis |
| id | usm-9830 |
| institution | Universiti Sains Malaysia |
| language | English |
| last_indexed | 2025-10-17T07:56:50Z |
| publishDate | 2006 |
| record_format | EPrints |
| record_pdf | Restricted |
| spelling | usm-98302017-03-22T02:23:54Z http://eprints.usm.my/9830/ The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. Lee,, Kang Hai QC501-766 Electricity and magnetism Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm. 2006-07 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/9830/1/THE_EFFECT_OF_IMPLANT_ANGLE_AND_RESIST_SHADOWING_IN_SUBMICRON_IMPLANT_TECHNOLOGY.pdf Lee,, Kang Hai (2006) The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. Masters thesis, Universiti Sains Malaysia. |
| spellingShingle | QC501-766 Electricity and magnetism Lee,, Kang Hai The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| thesis_level | Master |
| title | The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| title_full | The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| title_fullStr | The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| title_full_unstemmed | The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| title_short | The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. |
| title_sort | effect of implant angle and resist shadowing in submicron implant technology qc702 7 i55 l478 2006 f rb |
| topic | QC501-766 Electricity and magnetism |
| url | http://eprints.usm.my/9830/ |
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