Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry

Liquid nitrogen is widely used in the manufacturing field as it its ability to maintain temperatures far below the freezing point of water. One of the applications of LN2 in semiconductor industry is to produce cold air to run or soak the device in cold condition also to function as the cooling agen...

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Main Author: Revee, Sharveen
Format: Thesis
Language:English
English
Published: 2021
Subjects:
Online Access:http://eprints.utem.edu.my/id/eprint/26865/
https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=121724
Abstract Abstract here
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author Revee, Sharveen
author_facet Revee, Sharveen
author_sort Revee, Sharveen
description Liquid nitrogen is widely used in the manufacturing field as it its ability to maintain temperatures far below the freezing point of water. One of the applications of LN2 in semiconductor industry is to produce cold air to run or soak the device in cold condition also to function as the cooling agent when the handler is ramping down from running hot condition. Unlike the LN2 gas, a heater is used as the total opposite which is to heat the cold air in order to obtain the targeted temperature so that it the temperature doesn’t fall too low. However, while the heater is supplying heat, LN2 will undergo a sudden expansion when contact with the heater in the test site. The expansion of the gas creates a pressure that will block the original flow path. As the LN2 supply will be continues will ramping down, the block will cause the LN2 to forcefully leak out through Z-link joint and onto the parts of the handlers which is the belt of the input and output shuttle, the wire and cables and so on. The objectives of the experiment are to eliminate the LN2 rain without disrupting the overall performance of the machine. Moreover, to achieve a minimal CDA pressure for each zone which can guarantee LN2 mixture independent on control logic. On top of that, to provide a stable LTS CDA pressure before entering LN2 box by combining system and purge CDA supply. The pressure is targeted to be greater than 40psi while the machine is ramping from 175ºC to -55ºC. This study shows the experiment setup whereby engaging the minimum pressure of 40psi as well as the software control system that changes the duty cycle of both heater and LN2 in both zones where the LN2 rain is present and by doing that, managed to eliminate the LN2 rain issue.
format Thesis
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institution Universiti Teknikal Malaysia Melaka
language English
English
publishDate 2021
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spelling utem-268652023-05-17T09:57:18Z http://eprints.utem.edu.my/id/eprint/26865/ Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry Revee, Sharveen T Technology (General) TK Electrical engineering. Electronics Nuclear engineering Liquid nitrogen is widely used in the manufacturing field as it its ability to maintain temperatures far below the freezing point of water. One of the applications of LN2 in semiconductor industry is to produce cold air to run or soak the device in cold condition also to function as the cooling agent when the handler is ramping down from running hot condition. Unlike the LN2 gas, a heater is used as the total opposite which is to heat the cold air in order to obtain the targeted temperature so that it the temperature doesn’t fall too low. However, while the heater is supplying heat, LN2 will undergo a sudden expansion when contact with the heater in the test site. The expansion of the gas creates a pressure that will block the original flow path. As the LN2 supply will be continues will ramping down, the block will cause the LN2 to forcefully leak out through Z-link joint and onto the parts of the handlers which is the belt of the input and output shuttle, the wire and cables and so on. The objectives of the experiment are to eliminate the LN2 rain without disrupting the overall performance of the machine. Moreover, to achieve a minimal CDA pressure for each zone which can guarantee LN2 mixture independent on control logic. On top of that, to provide a stable LTS CDA pressure before entering LN2 box by combining system and purge CDA supply. The pressure is targeted to be greater than 40psi while the machine is ramping from 175ºC to -55ºC. This study shows the experiment setup whereby engaging the minimum pressure of 40psi as well as the software control system that changes the duty cycle of both heater and LN2 in both zones where the LN2 rain is present and by doing that, managed to eliminate the LN2 rain issue. 2021 Thesis NonPeerReviewed text en http://eprints.utem.edu.my/id/eprint/26865/1/Elimination%20of%20liquid%20nitrogen%20%28LN2%29%20rain%20on%20test%20handler%20in%20semiconductor%20industry.pdf text en http://eprints.utem.edu.my/id/eprint/26865/2/Elimination%20of%20liquid%20nitrogen%20%28LN2%29%20rain%20on%20test%20handler%20in%20semiconductor%20industry.pdf Revee, Sharveen (2021) Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry. Masters thesis, Universiti Teknikal Malaysia Melaka. https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=121724
spellingShingle T Technology (General)
TK Electrical engineering. Electronics Nuclear engineering
Revee, Sharveen
Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
thesis_level Master
title Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
title_full Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
title_fullStr Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
title_full_unstemmed Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
title_short Elimination of liquid nitrogen (LN2) rain on test handler in semiconductor industry
title_sort elimination of liquid nitrogen ln2 rain on test handler in semiconductor industry
topic T Technology (General)
TK Electrical engineering. Electronics Nuclear engineering
url http://eprints.utem.edu.my/id/eprint/26865/
https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=121724
work_keys_str_mv AT reveesharveen eliminationofliquidnitrogenln2rainontesthandlerinsemiconductorindustry