Comparison of the structural properties of silicon carbide using very high frequency plasma enhanced chemical vapour deposition with magnetron sputtering techniques
In this study, the feasibility of using very high frequency (100 MHz to 200 MHz) Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique to deposit crystalline silicon carbide (SiC) thin films was investigated. High quality crystalline SiC film is very challenging to be produced since high...
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| Format: | Thèse |
| Langue: | anglais |
| Publié: |
2022
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| Accès en ligne: | http://eprints.utm.my/101996/1/MuhamadMuizzudinAzaliMFS2022.pdf.pdf |