Comparison of the structural properties of silicon carbide using very high frequency plasma enhanced chemical vapour deposition with magnetron sputtering techniques

In this study, the feasibility of using very high frequency (100 MHz to 200 MHz) Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique to deposit crystalline silicon carbide (SiC) thin films was investigated. High quality crystalline SiC film is very challenging to be produced since high...

書誌詳細
第一著者:	Azali, Muhamad Muizzudin
フォーマット:	学位論文
言語:	英語
出版事項:	2022
主題:	QC Physics
オンライン･アクセス:	http://eprints.utm.my/101996/1/MuhamadMuizzudinAzaliMFS2022.pdf.pdf

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