Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system

Deposition of thin film using plasma sputtering system had been widely discovered and developed extensively for many years in technological and industrial process especially formation of titanium nitride (TiN) films due to its high hardness, good wear resistance, low friction coeffcient and chemical...

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Bibliographic Details
Main Author:	Soo, Reh How
Format:	Thesis
Language:	English English English
Published:	2018
Subjects:	TK7800-8360 Electronics
Online Access:	http://eprints.uthm.edu.my/245/
Abstract	Abstract here

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