Electrical properties of copper nitride thin film prepared by reactive DC sputtering
The purpose of this research is to study the electrical properties of copper nitride (Cu3N) thin films. Cu3N were deposited on corning glass substrates by using reactive DC sputtering technique. Four samples were prepared with different deposition time to obtain samples of different thicknesses. The...
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| フォーマット: | 学位論文 |
| 言語: | 英語 |
| 出版事項: |
2013
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| 主題: | |
| オンライン･アクセス: | http://eprints.utm.my/32043/1/WanNoorEziantiMFS2013.pdf |