Omar, M. F., & Abd. Kahmim Ismail, s. (2025). Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition. Universiti Teknologi Malaysia.
Chicago Style (17th ed.) CitationOmar, Muhammad Firdaus, and supervisor Abd. Kahmim Ismail. Development of Very High Frequency Plasma Enhanced Chemical Vapour Deposition for Nanostructure Silicon Carbide Thin Film Deposition. Universiti Teknologi Malaysia, 2025.
MLA (9th ed.) CitationOmar, Muhammad Firdaus, and supervisor Abd. Kahmim Ismail. Development of Very High Frequency Plasma Enhanced Chemical Vapour Deposition for Nanostructure Silicon Carbide Thin Film Deposition. Universiti Teknologi Malaysia, 2025.
Warning: These citations may not always be 100% accurate.