Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
This research compared the effect ofPDC and DC substrate biases applications at -500V and study the effect of PDC voltage variations (OV, -200V, -500V, -800V) during substrate cleaning on coating adhesion. The substrate and coating materials used were tungsten carbide(WC) and titanium nitride (TiN),...
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| フォーマット: | 学位論文 |
| 言語: | 英語 |
| 出版事項: |
2013
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| 主題: | |
| オンライン･アクセス: | http://eprints.utem.edu.my/id/eprint/15744/1/Effect%20of%20in%20SITU%20DC%20and%20PDC%20substrate%20bias%20cleaning%20process%20on%20TiN%20coating%20adhesion%20in%20PVD%20system006%2824%29.pdf |