Development on copper to copper bonding optimization on low-k structure integrated circuit device

Wire bonding technology has been widely used in the semiconductor industry for interconnection between chip and lead frame or substrate.Gold (Au) is the most widely used metal for Integrated Circuit (IC) wire bonding because of its resistance to surface corrosion and high productivity through the Au...

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書誌詳細
第一著者: Chan, Swee Guan
フォーマット: 学位論文
言語:英語
英語
出版事項: 2016
主題:
オンライン・アクセス:http://eprints.utem.edu.my/id/eprint/20494/1/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
http://eprints.utem.edu.my/id/eprint/20494/2/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
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author Chan, Swee Guan
author_facet Chan, Swee Guan
author_sort Chan, Swee Guan
description Wire bonding technology has been widely used in the semiconductor industry for interconnection between chip and lead frame or substrate.Gold (Au) is the most widely used metal for Integrated Circuit (IC) wire bonding because of its resistance to surface corrosion and high productivity through the Au ball bonding process.However,the upward trend in gold price has prompted the industry interest in gold wire replacement.Copper (Cu) would be one of the best selections as an interconnection material in semiconductor packaging because of its obvious advantages over gold in cost comparison.Cu wire also has lower resistivity where could offer improvement in circuit performance.Despite its material properties advantages,Cu wire bonding technology has still facing many technical challenges due to its characteristic.Copper are very corrosive.Oxidation could easily happen on copper wire and bond pad which cause poor interconnect.In order to solve the bondability issue of Cu wire bonding,the selection of wire capillary and bonding parameters are among key factor must be considered.Design of Experiment (DOE)and evaluations were carried out to have better understanding of this technology.Ball bond diameter, ball height,ball pull and ball shear are among key wire bonding responses been analysed.This development covered the impact analysis of bond pad and circuitry underneath using pad cratering method.Experiment results shown that all bonding responses are meeting targeted results even with additional welded area and cross-section check.One of the key findings was the pre-bonding and initial bonding parameters are crucial for good bondability in Cu-Cu bonding technology.This new understanding becomes a gate opener for further Cu-Cu package development.
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spelling oai:eprints.utem.edu.my:204942022-12-19T10:59:35Z http://eprints.utem.edu.my/id/eprint/20494/ Development on copper to copper bonding optimization on low-k structure integrated circuit device Chan, Swee Guan T Technology (General) TK Electrical engineering. Electronics Nuclear engineering Wire bonding technology has been widely used in the semiconductor industry for interconnection between chip and lead frame or substrate.Gold (Au) is the most widely used metal for Integrated Circuit (IC) wire bonding because of its resistance to surface corrosion and high productivity through the Au ball bonding process.However,the upward trend in gold price has prompted the industry interest in gold wire replacement.Copper (Cu) would be one of the best selections as an interconnection material in semiconductor packaging because of its obvious advantages over gold in cost comparison.Cu wire also has lower resistivity where could offer improvement in circuit performance.Despite its material properties advantages,Cu wire bonding technology has still facing many technical challenges due to its characteristic.Copper are very corrosive.Oxidation could easily happen on copper wire and bond pad which cause poor interconnect.In order to solve the bondability issue of Cu wire bonding,the selection of wire capillary and bonding parameters are among key factor must be considered.Design of Experiment (DOE)and evaluations were carried out to have better understanding of this technology.Ball bond diameter, ball height,ball pull and ball shear are among key wire bonding responses been analysed.This development covered the impact analysis of bond pad and circuitry underneath using pad cratering method.Experiment results shown that all bonding responses are meeting targeted results even with additional welded area and cross-section check.One of the key findings was the pre-bonding and initial bonding parameters are crucial for good bondability in Cu-Cu bonding technology.This new understanding becomes a gate opener for further Cu-Cu package development. 2016 Thesis NonPeerReviewed text en http://eprints.utem.edu.my/id/eprint/20494/1/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf text en http://eprints.utem.edu.my/id/eprint/20494/2/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf Chan, Swee Guan (2016) Development on copper to copper bonding optimization on low-k structure integrated circuit device. Masters thesis, Universiti Teknikal Malaysia Melaka. https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=104974
spellingShingle T Technology (General)
TK Electrical engineering. Electronics Nuclear engineering
Chan, Swee Guan
Development on copper to copper bonding optimization on low-k structure integrated circuit device
title Development on copper to copper bonding optimization on low-k structure integrated circuit device
title_full Development on copper to copper bonding optimization on low-k structure integrated circuit device
title_fullStr Development on copper to copper bonding optimization on low-k structure integrated circuit device
title_full_unstemmed Development on copper to copper bonding optimization on low-k structure integrated circuit device
title_short Development on copper to copper bonding optimization on low-k structure integrated circuit device
title_sort development on copper to copper bonding optimization on low k structure integrated circuit device
topic T Technology (General)
TK Electrical engineering. Electronics Nuclear engineering
url http://eprints.utem.edu.my/id/eprint/20494/1/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
http://eprints.utem.edu.my/id/eprint/20494/2/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
url-record http://eprints.utem.edu.my/id/eprint/20494/
https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=104974
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