Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future c...
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| フォーマット: | 学位論文 |
| 言語: | 英語 |
| 出版事項: |
2004
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| 主題: | |
| オンライン･アクセス: | http://eprints.usm.my/3087/ |
| _version_ | 1846214834517966848 |
|---|---|
| author | Lim, Alex Ying Kiat |
| author_facet | Lim, Alex Ying Kiat |
| author_sort | Lim, Alex Ying Kiat |
| description | Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah.
The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication. |
| first_indexed | 2025-10-17T07:52:16Z |
| format | Thesis |
| id | usm-3087 |
| institution | Universiti Sains Malaysia |
| language | English |
| last_indexed | 2025-10-17T07:52:16Z |
| publishDate | 2004 |
| record_format | eprints |
| spelling | usm-30872017-03-22T02:23:56Z http://eprints.usm.my/3087/ Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] Lim, Alex Ying Kiat QC501-766 Electricity and magnetism Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication. 2004-03 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf Lim, Alex Ying Kiat (2004) Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]. Masters thesis, Universiti Sains Malaysia. |
| spellingShingle | QC501-766 Electricity and magnetism Lim, Alex Ying Kiat Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title | Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title_full | Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title_fullStr | Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title_full_unstemmed | Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title_short | Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] |
| title_sort | carbon doped silicon dioxide low k dielectric material qc585 75 s55 l732 2004 f rb microfiche 7649 |
| topic | QC501-766 Electricity and magnetism |
| url | http://eprints.usm.my/3087/ |
| work_keys_str_mv | AT limalexyingkiat carbondopedsilicondioxidelowkdielectricmaterialqc58575s55l7322004frbmicrofiche7649 |