Development Of Tetragonal Zirconia Thin Film For Semiconductor Application

In this work, the YSZ and Nb-YSZ film were produced by using chemical solution deposition (CSD) technique via dip coating. The films were deposited on two different substrates (silica glass and Si wafer). Various parameters were conducted in this study including numbers of coatings, concentration of...

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Détails bibliographiques
Auteur principal:	Chan, Pooi Quan
Format:	Thèse
Langue:	anglais
Publié:	2011
Sujets:	TN1-997 Mining engineering. Metallurgy
Accès en ligne:	http://eprints.usm.my/43232/
Abstract	Abstract here

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