Development Of Tetragonal Zirconia Thin Film For Semiconductor Application

In this work, the YSZ and Nb-YSZ film were produced by using chemical solution deposition (CSD) technique via dip coating. The films were deposited on two different substrates (silica glass and Si wafer). Various parameters were conducted in this study including numbers of coatings, concentration of...

書誌詳細
第一著者:	Chan, Pooi Quan
フォーマット:	学位論文
言語:	英語
出版事項:	2011
主題:	TN1-997 Mining engineering. Metallurgy
オンライン･アクセス:	http://eprints.usm.my/43232/

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