Remote global alignment error for cycle time improvement of pad inductor layer
Lithography is the key process which transfers the pattern from mask (reticle) to wafer; and pad inductor layer is the last layer in photo masking. The cycle time for pad inductor layer has increased in Silterra Malaysia Sdn. Bhd., by 32% per month due to Global Alignment (GA) error. Meanwhile, engi...
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| Format: | Thesis |
| Language: | English English |
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2018
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| Online Access: | http://eprints.utem.edu.my/id/eprint/23781/ http://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=112889 |
| Abstract | Abstract here |