Remote global alignment error for cycle time improvement of pad inductor layer

Lithography is the key process which transfers the pattern from mask (reticle) to wafer; and pad inductor layer is the last layer in photo masking. The cycle time for pad inductor layer has increased in Silterra Malaysia Sdn. Bhd., by 32% per month due to Global Alignment (GA) error. Meanwhile, engi...

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Détails bibliographiques
Auteur principal:	Devadas, Saandilian
Format:	Thèse
Langue:	anglais anglais
Publié:	2018
Sujets:	T Technology (General) TS Manufactures
Accès en ligne:	http://eprints.utem.edu.my/id/eprint/23781/ http://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=112889
Abstract	Abstract here

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