Characterization of reticle esd threshold voltage measurement for CMOS semiconductor manufacturing
A reticle is a critical apparatus in patterning Integrated Circuit (IC) transfer to a silicon wafer during the lithography process and is considered the heart of a wafer fabrication process. It is very sensitive with accurate patterns designed into a nano-meter level on clear quartz. A typical Compl...
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| Format: | Thesis |
| Language: | English English |
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2022
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| Online Access: | http://eprints.utem.edu.my/id/eprint/26871/ https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=122185 |
| Abstract | Abstract here |