Characterization of reticle esd threshold voltage measurement for CMOS semiconductor manufacturing

A reticle is a critical apparatus in patterning Integrated Circuit (IC) transfer to a silicon wafer during the lithography process and is considered the heart of a wafer fabrication process. It is very sensitive with accurate patterns designed into a nano-meter level on clear quartz. A typical Compl...

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Bibliographic Details
Main Author:	Razman, Harriman
Format:	Thesis
Language:	English English
Published:	2022
Subjects:	T Technology (General) TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://eprints.utem.edu.my/id/eprint/26871/ https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=122185
Abstract	Abstract here

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