Deposition and characterization of polycrystalline diamond coated on silicon nitride and tungsten carbide using microwave plasma assisted chemical vapour deposition technique

Diamond (sp3) is a unique engineering material, due to its superior combination of physical, optical and chemical properties and thus it is possible to take advantage of these properties in many engineering applications for which high hardness, high resistance to corrosion and erosion is required. I...

Description complète

Détails bibliographiques
Auteur principal:	Agung Purniawan, Agung Purniawan
Format:	Thèse
Langue:	anglais
Publié:	2008
Sujets:	TJ Mechanical engineering and machinery
Accès en ligne:	http://eprints.utm.my/10010/1/AgungPurniawanMFKM2008.pdf

Documents similaires

Surface treatment on tungsten carbide substrate prior to hot filament chemical vapour deposition diamond coating
par: Engku Abu Bakar, Engku Mohammad Nazim
Publié: (2014)

Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
par: Awang Sh'ri, Dayangku Noorfazidah
Publié: (2009)

Effect of surface pretreatments on the deposition of polycrystalline diamond on silicon nitride substrates using hot filament chemical vapor deposition method
par: Dayangku Noorfazidah, Awang Sh'ri
Publié: (2009)

Nanocrystalline diamond deposited on tungsten carbidecobalt substrates using hot filament chemical vapour deposition technique
par: Yong, Tze Mi
Publié: (2015)

Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition
par: Omar, Muhammad Firdaus
Publié: (2016)

Structural and optical properties of silicon carbide quantum dots grown by very high frequency plasma enhanced chemical vapour deposition
par: Jusoh, Haezah Munyati
Publié: (2020)

The morphology and structural properties of silicon carbide quantum dots grown by very high frequency plasma enhanced chemical vapour deposition
par: Abd. Karim, Nur Farah Nadia
Publié: (2019)

Effect of different pretreatment parameters on silicon nitride substrate surface roughness prior to diamond deposition
par: Saaran, Idris
Publié: (2010)

Comparison of the structural properties of silicon carbide using very high frequency plasma enhanced chemical vapour deposition with magnetron sputtering techniques
par: Azali, Muhamad Muizzudin
Publié: (2022)

Fabrication Of Gallium Nitride Nanowires Via Chemical Vapour Deposition
par: Low, Li Li
Publié: (2012)

Effect of pretreatment parameters on cobalt removal and surface roughness of tungsten carbide prior to diamond coating
par: Abdullah, Arman Shah
Publié: (2010)

Effect of pretreatment parameters on surface roughness and cobalt removal of tungsten carbide before diamond coating
par: Shirdar, Mostafa Rezazadeh
Publié: (2012)

Microwave assisted tungsten carbide from waste kernel shell for remediation of chlorodifluoromethane
par: Hanapi, Siti Zubaidah
Publié: (2011)

Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating
par: Safari, Habiballah
Publié: (2010)

Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering
par: Rosman, Nor Hariz Kadir
Publié: (2020)

Structural and optical properties of diamond like carbon films using direct current plasma enhanced chemical vapor deposition
par: Ong, Wai Kit
Publié: (2015)

Deposition of high hardness coating by low power atmospheric pressure microwave plasma spray and the characteristics evaluations
par: Ahmad Redza, Ahmad Mokhtar
Publié: (2012)

Viability of microwave hybrid sintering process for tungsten carbide cermets
par: Hammad Thauri, Shahdura
Publié: (2016)

Optimization of physical vapour deposition coating process parameters using genetic algorithm
par: Mohammad Jarrah, Mu'ath Ibrahim
Publié: (2014)

Influence of processing parameters on the properties of tin coatings deposited on tool steels using cathodic arc physical vapour deposition technique
par: Ali, Mubarak
Publié: (2007)

The structural and optical properties of hydrogenated amorphous carbon (a-C:H) thin films deposited using a direct current-plasma enhanced chemical vapour deposition (DC-PECVD) technique
par: Abu Bakar, Suriani
Publié: (2005)

Studies Of The Effect Of Post Deposition Annealing To The Ceo2 Thin Film On P-Type Silicon And N-Type Silicon Carbide Substrates
par: Chuah, Soo Kiet
Publié: (2011)

Optimization of vhf-pecvd deposition parameters for silicon carbide film using in-situ and in-line gas phase analysis
par: Azali, Muhamad Muizzudin
Publié: (2022)

Investigation Of Metal-Organic Decomposed (MOD) Cerium Oxide (Ceo2) Gate Deposited On Silicon And Gallium Nitride Substrates Via Spin-On Coating Technique
par: Quah, Hock Jin
Publié: (2010)

Effect of catalysts and precursors in the synthesis of carbon nanotubes by catalytic chemical vapour deposition
par: Sulaiman, Yusran
Publié: (2006)

Investigation of simultaneous thermal oxidation and nitridation of sputtered zirconium on silicon and silicon carbide in nitrous oxide gas environment
par: Wong, Yew Hoong
Publié: (2012)

UV-Vis characterization of diamond-like carbon thin films deposited using (DC-PECVD)
par: Ab. Rahman, Nur Alifah
Publié: (2010)

Preparation of radiation grafted kenaf absorbent for aluminium removal via chemical vapour deposition
par: Nor Azillah Fatimah, Nor Azillah Fatimah
Publié: (2016)

Surfaces (Technology) Surface preparation Coating processes Tungsten carbide-cobalt alloys
par: Wong, Kah Yan
Publié: (2021)

Synthesis And Characterization Of Nanocrystalline Cds Thin Films By Microwave-Assisted Chemical Bath Deposition For Photodetectors Application
par: Mohammed Ali, Mohammed Husham
Publié: (2015)

Investigation Of Adhesion Between Microwave Plasma Treated Epoxy And Silicone
par: Choong, Lai Fan
Publié: (2020)

Study of III-nitrides heterostructures grown by plasma-assisted molecular beam epitaxy (PAMBE)
par: Chin, Che Woei
Publié: (2009)

Synthesis and characterization of carbon nanotubes in a vertical floating catalyst chemical vapour deposition reactor
par: Ahmed, Thamer H.
Publié: (2011)

The synthesis of vertically aligned carbon nanotubes on nanostructured porous silicon template by in-situ catalyst double thermal chemical vapour deposition method / Noor Asnida Asli
par: Asli, Noor Asnida
Publié: (2014)

Characterisation of electroless deposition parameter of copper on silicon wafer for through silicon via application
par: Mior Shahidin, Shazatul Akmaliah
Publié: (2019)

Synthesis and characterisation of multi-walled carbon nanotubes on supported catalysts via catalytic chemical vapour deposition
par: Tee, Jia Chee
Publié: (2006)

Crystallization of polycrystalline silicon thin film by excimer laser annealing
par: Ab. Razak, Siti Noraiza
Publié: (2011)

Performance evaluation of wire electro-discharge machining on tungsten carbide
par: Hassan, Mas Ayu
Publié: (2006)

Low-temperature growth of nitrogen-doped nanocrystalline graphene films by cold-wall plasma assisted chemical vapor deposition for gas sensor application
par: Zainal Ariffin, Nur Hamizah
Publié: (2022)

Characterisation And Performance Of Sno2 Film For Detection Of Volatile Organic Compounds Synthesised By Chemical Vapour Deposition Method
par: Tan, Xian-Ju
Publié: (2013)