Optimization of vhf-pecvd deposition parameters for silicon carbide film using in-situ and in-line gas phase analysis
In this study, the feasibility of using very high frequency (100 MHz to 200 MHz) Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique to deposit crystalline silicon carbide (SiC) thin films was investigated. High quality crystalline SiC film is very challenging to be produced since high...
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| フォーマット: | 学位論文 |
| 言語: | 英語 |
| 出版事項: |
2022
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| 主題: | |
| オンライン･アクセス: | http://eprints.utm.my/102659/1/MuhamadMuizzudinAzaliMFS2022.pdf.pdf |