Optimization of vhf-pecvd deposition parameters for silicon carbide film using in-situ and in-line gas phase analysis

In this study, the feasibility of using very high frequency (100 MHz to 200 MHz) Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique to deposit crystalline silicon carbide (SiC) thin films was investigated. High quality crystalline SiC film is very challenging to be produced since high...

पूर्ण विवरण

ग्रंथसूची विवरण
मुख्य लेखक:	Azali, Muhamad Muizzudin
स्वरूप:	थीसिस
भाषा:	अंग्रेज़ी
प्रकाशित:	2022
विषय:	QC Physics
ऑनलाइन पहुंच:	http://eprints.utm.my/102659/1/MuhamadMuizzudinAzaliMFS2022.pdf.pdf

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