Structural properties of hydrogenated amorphous silicon (A-SI:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD)
An investigation of the structural properties of hydrogenated amorphous silicon (a-Si:H) thin films prepared by plasma enhanced chemical vapour deposition of silane (SiH4) was done using a combination of atomic force microscopy (AFM), photoluminescence, infrared and UV spectroscopy. Films were prepa...
| Auteur principal: | |
|---|---|
| Format: | Thèse |
| Langue: | anglais |
| Publié: |
2005
|
| Sujets: | |
| Accès en ligne: | http://eprints.utm.my/5093/1/HasbullahAnthonyHasbiMFS2005.pdf |