An investigation of physical processes in nanosphere lithography

Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...

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Auteur principal:	Agam, Mohd Arif
Format:	Thèse
Langue:	anglais
Publié:	2006
Sujets:	TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials
Accès en ligne:	http://eprints.uthm.edu.my/7348/
Abstract	Abstract here