An investigation of physical processes in nanosphere lithography

Various physical processes have been investigated in order to improve the Nanosphere Lithography (NSL) technique by modifying the nanosphere structures. Polysytrene CPS) nanospheres used in NSL can be modified in three schemes: Electron beam, heat and chemical manipulation techniques. The most...

وصف كامل

التفاصيل البيبلوغرافية
المؤلف الرئيسي:	Agam, Mohd Arif
التنسيق:	أطروحة
اللغة:	الإنجليزية
منشور في:	2006
الموضوعات:	TA Engineering (General). Civil engineering (General) TA401-492 Materials of engineering and construction. Mechanics of materials
الوصول للمادة أونلاين:	http://eprints.uthm.edu.my/7348/
Abstract	Abstract here

مواد مشابهة

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