Comparison of the structural properties of silicon carbide using very high frequency plasma enhanced chemical vapour deposition with magnetron sputtering techniques
Also available in printed version
| Auteur principal: | |
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| Format: | Dissertation |
| Langue: | anglais |
| Publié: |
Universiti Teknologi Malaysia
2025
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| Sujets: | |
| Accès en ligne: | https://utmik.utm.my/handle/123456789/43377 |
| Abstract | Abstract here |
