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Development on copper to copper bonding optimization on low-k structure integrated circuit device

Wire bonding technology has been widely used in the semiconductor industry for interconnection between chip and lead frame or substrate.Gold (Au) is the most widely used metal for Integrated Circuit (IC) wire bonding because of its resistance to surface corrosion and high productivity through the Au...

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Détails bibliographiques
Auteur principal: Chan, Swee Guan
Format: Thèse
Langue:anglais
anglais
Publié: 2016
Sujets:
T Technology (General)
TK Electrical engineering. Electronics Nuclear engineering
Accès en ligne:http://eprints.utem.edu.my/id/eprint/20494/1/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
http://eprints.utem.edu.my/id/eprint/20494/2/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
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http://eprints.utem.edu.my/id/eprint/20494/1/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf
http://eprints.utem.edu.my/id/eprint/20494/2/Development%20on%20copper%20to%20copper%20bonding%20optimization%20on%20low-k%20structure%20integrated%20circuit%20device.pdf

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