Formation of silicon nanowires by chemical vapour deposition technique using indium catalyst / Chong Su Kong

Formations of silicon nanowires using aurum and indium catalyst by plasma-enhanced chemical vapour deposition and hot-wire chemical vapour deposition techniques were studied in this work. The depositions were carried out by using a home-built dual-mode plasma-assisted hot-wire chemical vapour dep...

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Détails bibliographiques
Auteur principal: Chong, Su Kong
Format: Thèse
Publié: 2012
Sujets: