Formation of silicon nanowires by chemical vapour deposition technique using indium catalyst / Chong Su Kong

Formations of silicon nanowires using aurum and indium catalyst by plasma-enhanced chemical vapour deposition and hot-wire chemical vapour deposition techniques were studied in this work. The depositions were carried out by using a home-built dual-mode plasma-assisted hot-wire chemical vapour dep...

詳細記述

書誌詳細
第一著者: Chong, Su Kong
フォーマット: 学位論文
出版事項: 2012
主題: